OXIDE SINTERED BODY, METHOD FOR PRODUCING SAME, AND STARTING MATERIAL POWDER FOR PRODUCING OXIDE SINTERED BODY

摘要

Disclosed is an oxide sintered body which is formed from indium (In), gallium (Ga), zinc (Zn) and oxygen (O) and represented by the following formula: InxGayZnzOa (wherein x/(x + y) is 0.2-0.8, z/(x + y + z) is 0.1-0.5, and a = (3/2)x + (3/2)y + z). The oxide sintered body is characterized in that the concentration of volatile impurities contained in the oxide sintered body is not more than 20 ppm. The oxide sintered body is capable of providing a sputtering target that has a higher density and a lower bulk resistance, while suppressing swelling or cracking during the production of the sputtering target. The oxide sintered body can be used for the purpose of producing an IGZO target which enables DC sputtering, while keeping the formation of nodules to a minimum and suppressing abnormal discharge.