| 摘要 |
<p>On a replica substrate 1a, a reflection layer 11, a first dielectric layer 12 made of ZnS - SiO2, a. recording layer 13 made of a phase change type recording material, and a second dielectric layer 14 made of ZnS - SiO2 are successively formed. In addition, a reaction protection layer 15 made of Si3N4 or SiO2 is formed on the second dielectric layer 14. As a result, an information signal portion 1c is composed. A light transmissivity sheet is formed through an adhesive layer so that the light transmissivity sheet coats an information signal portion 1c. As a result, a light transmission layer is composed. When the reaction protection layer 15 is not formed, a reaction protection resin layer made of an ultraviolet ray setting resin is formed so that the reaction protection resin layer coats the information signal portion 1c. <IMAGE></p> |
