发明名称 SEMICONDUCTOR DEVICE AND METHOD OF FORMING SHIELDING LAYER AFTER ENCAPSULATION AND GROUNDED THROUGH INTERCONNECT STRUCTURE
摘要 PURPOSE: A semiconductor device and a method of forming shielding layer after encapsulation and grounded through interconnect structure are provided to prevent the generation of a void in encapsulant around a semiconductor die. CONSTITUTION: A substrate(52) includes a conductive layer. An interconnection structure is formed on a substrate and is electrically connected to the conductive layer. A semiconductor device is mounted in the substrate. An encapsulant is deposited on the semiconductor device and the interconnection structure.
申请公布号 KR20100119720(A) 申请公布日期 2010.11.10
申请号 KR20100038463 申请日期 2010.04.26
申请人 STATS CHIPPAC LTD. 发明人 CHI, HEE JO;CHO, NAM JU;SHIN, HAN GIL
分类号 H01L23/48;H01L21/60 主分类号 H01L23/48
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