发明名称 |
SEMICONDUCTOR DEVICE AND METHOD OF FORMING SHIELDING LAYER AFTER ENCAPSULATION AND GROUNDED THROUGH INTERCONNECT STRUCTURE |
摘要 |
PURPOSE: A semiconductor device and a method of forming shielding layer after encapsulation and grounded through interconnect structure are provided to prevent the generation of a void in encapsulant around a semiconductor die. CONSTITUTION: A substrate(52) includes a conductive layer. An interconnection structure is formed on a substrate and is electrically connected to the conductive layer. A semiconductor device is mounted in the substrate. An encapsulant is deposited on the semiconductor device and the interconnection structure. |
申请公布号 |
KR20100119720(A) |
申请公布日期 |
2010.11.10 |
申请号 |
KR20100038463 |
申请日期 |
2010.04.26 |
申请人 |
STATS CHIPPAC LTD. |
发明人 |
CHI, HEE JO;CHO, NAM JU;SHIN, HAN GIL |
分类号 |
H01L23/48;H01L21/60 |
主分类号 |
H01L23/48 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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