摘要 |
<p>PROBLEM TO BE SOLVED: To provide an etching liquid capable of reducing the galvanic effect effectively.SOLUTION: An etching liquid is prepared by dissolving an etching liquid and a nitrogen-containing five-membered heterocyclic compound in water in a specified ratio. When a user subjects a substrate containing an at least one first metal, e.g. gold, and an at least one second metal, e.g. copper, to wet etching with the etching liquid, the nitrogen-containing five-membered heterocyclic compound forms an organic coating on the first metal high in reduction potential, leading to prevention of an excessive etching phenomenon of the second metal owing to the galvanic effect.</p> |