发明名称 ETCHING LIQUID CAPABLE OF REDUCING GALVANIC EFFECT EFFECTIVELY
摘要 <p>PROBLEM TO BE SOLVED: To provide an etching liquid capable of reducing the galvanic effect effectively.SOLUTION: An etching liquid is prepared by dissolving an etching liquid and a nitrogen-containing five-membered heterocyclic compound in water in a specified ratio. When a user subjects a substrate containing an at least one first metal, e.g. gold, and an at least one second metal, e.g. copper, to wet etching with the etching liquid, the nitrogen-containing five-membered heterocyclic compound forms an organic coating on the first metal high in reduction potential, leading to prevention of an excessive etching phenomenon of the second metal owing to the galvanic effect.</p>
申请公布号 JP2015161015(A) 申请公布日期 2015.09.07
申请号 JP20140038719 申请日期 2014.02.28
申请人 E-CHEM ENTERPRISE CORP 发明人 TSAI JENG-YING;LIAO CHENG-KAI;HSU SU-FEI
分类号 C23F1/44;H01L21/306;H01L21/308;H05K3/06 主分类号 C23F1/44
代理机构 代理人
主权项
地址