| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a radiation-sensitive resin composition having less film thickness variation of an unexposed part in addition to sufficient sensitivity; an interlayer insulating film for a display element formed from the radiation-sensitive resin composition; and a formation method thereof. <P>SOLUTION: The present invention is a radiation-sensitive resin composition containing a polymer comprising a structural unit (I) having a group represented by the formula (1) and a structural unit (II) having an epoxy group, in [A] the same or different polymer molecules, where the content of the structural unit (I) is 10 mol% or more and 90 mol% or less. The film thickness variation rate of a film thickness T<SB POS="POST">1</SB>after developing to a film thickness T<SB POS="POST">0</SB>before developing is effectively 90% or more. <P>COPYRIGHT: (C)2013,JPO&INPIT |
