涂布膜形成装置、涂布膜形成方法、记忆媒体;COATING FILM FORMING APPARATUS, COATING FILM FORMING METHOD, AND STORAGE MEDIUM

摘要

涂布膜形成装置，系具备有：基板保持部，水平地保持基板；旋转机构，使保持于前述基板保持部的基板旋转；涂布液供给机构，为了在前述基板形成涂布膜而对前述基板的部供给涂布液；环状构件，为了覆盖基板的周缘部上方，而以沿着基板之圆周方向的方式，设成为环状；升降机构，使前述环状构件相对于前述基板保持部相对地升降；及控制部，以进行下述步骤的方式来输出控制讯号，该步骤，系包含：使前述环状构件位于对前述基板之周缘部上方之气流进行整流之处理位置的步骤；以藉由离心力使被供给至基板之部的涂布液朝向周缘部扩散的方式，使该基板以第1旋转数旋转的步骤；使前述环状构件相对于前述基板相对地上升，且使其退避至用于抑制因前述基板之旋转数下降所引起之该基板之表面附近之气流紊乱的退避位置的步骤；及使前述基板之旋转数下降至比前述第1旋转数低的第2旋转数的步骤。; rotating the substrate at a first revolution number such that a coating liquid supplied to a central portion of the substrate is diffused toward the peripheral edge portion by a centrifugal force; bringing the ring-shaped member to a retreated position where an air flow flowing near a front surface of the substrate is prevented from becoming turbulent; and reducing the revolution number of the substrate to a second revolution number lower than the first revolution number.