发明名称 METHOD FOR MANUFACTURING FILM FORMING MASK AND FILM FORMING MASK
摘要 <p>PROBLEM TO BE SOLVED: To suppress generation of burr at a marginal part of an opening pattern in forming the opening pattern by laser processing.SOLUTION: In a method for manufacturing a film forming mask with a structure where a resin film layer 1 provided with the opening pattern 4 having a predetermined prescribed shape and a magnetic metal material layer 2 provided with a clearance 7 having a size where the opening pattern 4 can be included are laminated, the opening pattern 4 is formed by radiating a laser beam to a part of the film layer 1 corresponding to the clearance 7 from both surface sides to penetrate the film layer 2 therethrough.</p>
申请公布号 JP2015145525(A) 申请公布日期 2015.08.13
申请号 JP20140018651 申请日期 2014.02.03
申请人 V TECHNOLOGY CO LTD 发明人 MIZUMURA MICHINOBU
分类号 C23C14/04;H01L21/302 主分类号 C23C14/04
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