| 摘要 |
A cleansing agent composition containing
(A) a sulfonate-type surfactant and/or a sulfate-type anionic surfactant, and
(B) a heterocyclic compound represented by the formula (1)
wherein R 1 and R 2 are each independently a hydrogen atom, a methyl group, a hydroxymethyl group, or a hydroxyethyl group, shows high detergency and low irritativeness, can suppress rough skin after washing and drying, and can be preferably used for cosmetic agents. |
