| 发明名称 |
APPARATUS AND METHOD FOR PROCESSING SUBSTRATE WITH FILM HAVING POROUS STRUCTURE (POROUS FILM) FORMED ON SURFACE LAYER THEREOF |
| 摘要 |
A method for processing a substrate with a porous film having a porous structure formed on a surface layer thereof includes the following a) and b) steps. The a) step is a step of mixing a first processing solution containing water with gas to generate droplets of the first processing solution and injecting the droplets of the first processing solution to the porous film. In addition, the b) step is a step of, after the a) step, mixing a second processing solution which is an organic solvent having higher volatility than the first processing solution with the gas to generate droplets of the second processing solution and injecting the droplets of the second processing solution to the porous film. |
| 申请公布号 |
US2015200087(A1) |
申请公布日期 |
2015.07.16 |
| 申请号 |
US201414570435 |
申请日期 |
2014.12.15 |
| 申请人 |
SCREEN Holdings Co., Ltd. |
发明人 |
KOBAYASHI Kenji |
| 分类号 |
H01L21/02;B08B3/04;H01L21/67 |
主分类号 |
H01L21/02 |
| 代理机构 |
|
代理人 |
|
| 主权项 |
1. A method for processing a substrate with a porous film having a porous structure formed on a surface layer thereof comprising:
a) mixing a first processing solution containing water with gas to generate droplets of said first processing solution and injecting the droplets of said first processing solution to said porous film; and b) after said a) step, mixing a second processing solution which is an organic solvent having higher volatility than said first processing solution with the gas to generate droplets of said second processing solution and injecting the droplets of said second processing solution to said porous film. |
| 地址 |
Kyoto JP |
