发明名称 |
Array substrate for liquid crystal display device and method of manufacturing the same |
摘要 |
An array substrate for a liquid crystal display device comprises: gate and data lines crossing each other on a substrate to define a pixel region; a common line spaced apart from and parallel with the gate line; a thin film transistor in the pixel region and connected to the gate and data lines; a passivation layer on the thin film transistor; and pixel and common electrodes alternately arranged to produce an in-plane electric field, wherein each of the pixel and common electrodes has a double-layered structure of which the lower layer is formed of reflective conductive material and the upper layer is formed of transparent conductive material. |
申请公布号 |
US9082671(B2) |
申请公布日期 |
2015.07.14 |
申请号 |
US201213587625 |
申请日期 |
2012.08.16 |
申请人 |
LG DISPLAY CO., LTD. |
发明人 |
Jang Doo-Hee;Jung Young-Sup;Lee Jeong-Yun;Lee Ju-Ran;Choi Soo-Young |
分类号 |
G01R31/26;H01L27/12;G02F1/1343;G02F1/1335 |
主分类号 |
G01R31/26 |
代理机构 |
Brinks Gilson & Lione |
代理人 |
Brinks Gilson & Lione |
主权项 |
1. A method of manufacturing an array substrate for a liquid crystal display device, comprising:
depositing a reflective conductive material layer having a first thickness on a substrate; depositing a transparent conductive material layer having a second thickness on the reflective conductive material layer under a condition of H2O gas; forming a photoresist pattern on the transparent conductive material layer; performing a first etching process to the transparent conductive material layer and the reflective conductive material layer using the photoresist pattern as an etching mask, wherein the transparent conductive material layer has a first etch bias being larger than a second etch bias of the reflective conductive material layer such that top peripheral surfaces of the reflective conductive material layer is exposed; and performing a second etching process to the reflective conductive material layer using the etched transparent conductive material layer as an etching mask, thereby forming double-layered pixel and common electrodes. |
地址 |
Seoul KR |