| 摘要 |
<p>The present invention relates to a residual selenium collecting device in a semiconductor process. Especially, the residual selenium collecting device of a chamber which is made of a processor chamber, filter, a vacuum pump, and trap forms the trap with a cylindrical body having a predetermined capacity, an inner collecting tower, a body interior heater, an outlet cover, an exhaust guide pipe, a plurality of body exterior heaters, and selenium discharge control valve. A separate controller is connected to the trap. Thus, a pipe blockage or an efficiency decline problem of the vacuum pump and an accidental suspension problem of the vacuum pump which are generated because gas reacts in a discharge line or the vacuum pump and is formed in a power type in a process in which the gas is discharged from the processor chamber or process chemicals are directly bypassed to the vacuum pump can be solved. If the accidental suspension problem of the vacuum pump is generated in the production, a problem capable of bringing heavy economic losses such as the destruction due to a defect of products, the degradation of an equipment movement ratio, etc. can be solved. Thus, production costs according to the manufacture of a semiconductor can be drastically reduced.</p> |
