| 发明名称 |
CHEMICAL MECHANICAL POLISHING COMPOSITION COMPRISING POLYVINYL PHOSPHONIC ACID AND ITS DERIVATIVES |
| 摘要 |
A chemical mechanical polishing (CMP) composition comprising: (A) inorganic particles, organic particles, or a mixture or composite thereof, (B) at least one type of an organic polymeric compound as a dispersing agent or charge reversal agent comprising a phosphonate (P(═O)(OR1)(0R2) or phosphonic acid (P(═O)(OH)2) moiety or their deprotonated forms as pendant groups, wherein R1 is alkyl, aryl, alkylaryl, or arylalkyl, R2 is H, alkyl, aryl, alkylaryl, or arylalkyl, and (C) an aqueous medium. |
| 申请公布号 |
US2015159050(A1) |
申请公布日期 |
2015.06.11 |
| 申请号 |
US201114362510 |
申请日期 |
2011.12.21 |
| 申请人 |
Raman Vijay Immanuel;Schade Christian;Venkataraman Shyam Sundar;Su Eason Yu-Shen;Usman Ibrahim Sheik Ansar |
发明人 |
Raman Vijay Immanuel;Li Yuzhuo;Schade Christian;Venkataraman Shyam Sundar;Su Eason Yu-Shen;Usman Ibrahim Sheik Ansar |
| 分类号 |
C09G1/04;H01L21/306 |
主分类号 |
C09G1/04 |
| 代理机构 |
|
代理人 |
|
| 主权项 |
1. A chemical mechanical polishing (CMP) composition comprising:
(A) inorganic particles, organic particles, or any combination thereof, (B) at least one type of an organic polymeric compound as a dispersing agent or as a charge reversal agent, wherein the organic polymeric compound comprises a phosphonate (—P(═O)(OR1)(OR2)) or a phosphonic acid (—P(═O)(OH)2) moiety or their deprotonated forms as pendant groups,
wherein R1 is alkyl, aryl, alkylaryl, or arylalkyl,
R2 is H, alkyl, aryl, alkylaryl, or arylalkyl,and (C) an aqueous medium. |
| 地址 |
Mannheim DE |
