| 摘要 |
Magnetic thin film elements are made by plating a magnetic film e.g. Ni/Fe alloy, on a metal or metallized substrate which is pre-coated with an electrically conductive amorphous material consisting of carbon, silicon, or germanium, preferably formed by vapour deposition. The amorphous coating is stated to interrupt the influence of the crystal structure of the substrate on the magnetic film. In an example, a glass substrate is metallized by vapour deposition first with chromium (100 A thick), and then gold (100A), and with germanium (300A thick). The final electroplated film of Ni/Fe alloy is 1000 A thick and is deposited while applying a magnetic field of 100 oersteds. Graphs are given showing the relation between the thickness of the amorphous film and coercive force of the magnetic film. |
