| 摘要 |
A resist composition comprises a metal compound obtained from reaction of a starting metal compound having formula (A-1) or a (partial) hydrolyzate or condensate or (partial) hydrolytic condensate thereof, with a di- or trihydric alcohol having formula (A-2).;M(OR1A)4 (A-1);R2A(OH)m (A-2);In formula (A-1), M is Ti, Zr or Hf, and R1A is alkyl. In formula (A-2), m is 2 or 3, R2A is a divalent group when m=2 or a trivalent group when m=3. The resist composition exhibits improved resolution and edge roughness when processed by the EB or EUV lithography. |
| 主权项 |
1. A resist composition comprising a metal compound obtained from reaction of at least one metal compound selected from the group consisting of a metal compound having the general formula (A-1) and a metal compound obtained from (partial) hydrolysis or condensation, or (partial) hydrolytic condensation of the metal compound of formula (A-1), with a di- or trihydric alcohol having the general formula (A-2),
M(OR1A)4 (A-1) wherein M is an element selected from the group consisting of titanium, zirconium, and hafnium, and R1A is a straight or branched C1-C6 alkyl group,
R2A(OH)m (A-2) wherein m is 2 or 3, when m is 2, R2A is a divalent group selected from the group consisting of a straight, branched or cyclic C2-C20 alkylene, alkenylene, alkynylene or aralkylene group, a straight or branched alkylene group substituted with a cyclic alkyl, cyclic alkenyl or aryl moiety, and a straight or branched alkylene group having an intervening cyclic alkylene, cyclic alkenylene or arylene moiety, said divalent group may have a cyano moiety or be separated by a carbonyl, ester, ether, thiol or NR moiety wherein R is hydrogen or a straight or branched C1-C6 alkyl group, and when m is 3, R2A is a trivalent group corresponding to the divalent group with one hydrogen eliminated. |
