CURABLE RESIN COMPOSITION AND PATTERN FORMATION METHOD USING THE SAME

摘要

PROBLEM TO BE SOLVED: To provide a curable resin composition capable of forming a very fine and highly accurate pattern by an imprint method, and also to provide a pattern formation method using such a curable resin composition.SOLUTION: A curable resin composition includes one or more types of acrylic monomer, a polymerization initiator, and a fluorine-containing composition. The surface hardness of the curable resin composition after curing is 200 N/mmor more.