Method of optical proximity correction for modifying line patterns and integrated circuits with line patterns modified by the same

摘要

A method of optical proximity correction executed by a computer system and integrated circuit layout formed by the same, the step of optical proximity correction comprises: providing an integrated circuit layout with a plurality of parallel line patterns, wherein one side of at least one line pattern is provided with a convex portion; and modifying the integrated circuit layout by forming a concave portion corresponding to the convex portion at the other side of the line pattern.

主权项

1. A method of optical proximity correction executed by a computer system, comprising the steps of:
providing an integrated circuit layout with a plurality of parallel line patterns and a plurality of interconnect patterns disposed corresponding to said parallel line patterns, wherein one side of each one of said parallel line patterns has a convex portion so that said convex portion overlaps a corresponding one of said interconnect patterns; and using the computer system to modify said integrated circuit layout by forming a concave portion based on a position of said interconnect pattern, wherein a position of the concave portion is corresponding to said convex portion at the other side of said line pattern with said convex portion.