Lithographic apparatus and device manufacturing method

摘要

In a lithographic projection apparatus, a liquid supply system maintains liquid in a space between the projection system and the substrate. The liquid supply system may further include a de-mineralizing unit, a distillation unit, a de-hydrocarbonating unit, a UV radiation source, and/or a filter configured to purify the liquid. A gas content reduction device may be provided to reduce a gas content of the liquid. A chemical may be added to the liquid using an adding device to inhibit lifeform growth and components of the liquid supply system may be made of a material which is non-transparent to visible light such that growth of lifeforms may be reduced.

主权项

1. A lithographic projection apparatus comprising:
a substrate table constructed to hold a substrate; a projection system configured to project a patterned radiation beam onto a target portion of the substrate; a liquid supply system configured to at least partly fill a space between the projection system and the substrate with a liquid, the liquid supply system comprising a liquid purifier configured to purify the liquid, the liquid purifier being upstream of an inlet of the liquid supply system to the space and/or downstream of an outlet of the liquid supply system from the space and the liquid purifier comprising a filter and a degasser configured to separate gas and liquid; and a dispenser configured to add a chemical to the liquid in the liquid supply system.