发明名称 METHOD OF FABRICATING PATTERNED RETARDER USING POLARIZED PULSE UV
摘要 The present invention relates to a method of manufacturing a patterned retarder having first and second phase patterns by emitting a polarized pulse ultraviolet (UV) on an alignment film to form a first domain optically aligned with a first direction and a second domain optically aligned with a second direction. According to an embodiment of the present invention, provided is a method of manufacturing a patterned retarder comprising: (a) preparing a substrate; (b) applying an optical reactive agent on the substrate to form an optical reactive layer; and (c) exposing the optical reactive layer to form an optical alignment layer in which stripe-type first and second domains are alternately repeated, wherein the first domain is optically aligned with the first direction by the polarized pulse UV, and the second domain is optically aligned with the second direction by the polarized pulse UV.
申请公布号 KR20150004203(A) 申请公布日期 2015.01.12
申请号 KR20130077385 申请日期 2013.07.02
申请人 KOREA INSTITUTE OF INDUSTRIAL TECHNOLOGY 发明人 SHIN, GYO JIC;LEE, SANGK UG;CHOI, KYUNG HO;KANG, JU HUI;YANG, SI YEOL;JEONG, SEUNG YONG
分类号 G02B5/30;G02B5/00;G02F1/1335 主分类号 G02B5/30
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