METHOD FOR MANUFACTURING PHOTOVOLTAIC CI(G)S-BASED THIN FILM USING FLUX HAVING LOW MELTING POINT, AND CI(G)S-BASED THIN FILM MANUFACTURED BY SAME
摘要
<p>A method for fabricating a CI(G)S-based thin film using a flux having a low-melting temperature and a CI(G)S-based thin film fabricated thereby. The method comprises the steps of: (a) preparing CI(G)S-based nanoparticles; (b) preparing a slurry including the CI(G)S-based nanoparticles and a flux having a melting point of 30 to 400 °C; (c) coating the slurry on a substrate in a non-vacuum to form a CI(G)S-based precursor thin film; (d) drying the CI(G)S-based precursor thin film; and (e) performing selenization heat treatment of the CI(G)S-based precursor thin film using selenium (Se) vapor. According to the method, selenization heat treatment is performed at a lower temperature than that in a process of forming a CI(G)S-based thin film according to the prior art, and thus the fabrication cost can be reduced, while the growth of crystals in the thin film can be sufficiently enabled even at a low temperature.</p>