发明名称 FILM AND METHODS OF FORMING SAME
摘要 A film and method of forming a film provides an unmodified starting layer of a starting material, the starting layer having opposed first and second surfaces and an initial thickness, T1, and a modified surface layer of thickness T2 which is less than T1, formed in at least a portion of the second surface, wherein a portion of the modified surface layer is not supported by unmodified starting material removed from the first surface opposite the modified surface layer.
申请公布号 WO2014190077(A1) 申请公布日期 2014.11.27
申请号 WO2014US39011 申请日期 2014.05.21
申请人 EXOGENESIS CORPORATION;KIRKPATRICK, SEAN, R.;CHAU, SON 发明人 KIRKPATRICK, SEAN, R.;CHAU, SON
分类号 G03F1/50 主分类号 G03F1/50
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