Semiconductor device and method for manufacturing the same

摘要

A manufacturing method of a semiconductor device of the present invention includes the steps of forming a stacked body in which a semiconductor film, a gate insulating film, and a first conductive film are sequentially stacked over a substrate; selectively removing the stacked body to form a plurality of island-shaped stacked bodies; forming an insulating film to cover the plurality of island-shaped stacked bodies; removing a part of the insulating film to expose a surface of the first conductive film, such that a surface of the first conductive film almost coextensive with a height of the insulating film; forming a second conductive film over the first conductive film and a left part of the insulating film; forming a resist over the second conductive film; selectively removing the first conductive film and the second conductive film using the resist as a mask.

主权项

1. A semiconductor device comprising:
a first transistor comprising a first island-shaped semiconductor film, a first insulating film, a second insulating film, a floating gate, and a first conductive layer; a second transistor comprising a second island-shaped semiconductor film, a third insulating film, and a second conductive layer; a first wiring electrically connected to the first conductive layer; a second wiring electrically connected to the second conductive layer; and a third wiring electrically connected to the first transistor and the second transistor; and a fourth insulating layer over the first transistor and the second transistor, wherein the first insulating film, the floating gate, and the second insulating film are overlapped in this order and are interposed between the first island-shaped semiconductor film and the first conductive layer, wherein the third insulating film is interposed between the second island-shaped semiconductor film and the second conductive layer, wherein the second island-shaped semiconductor film includes a compound semiconductor, wherein the fourth insulating layer is in direct contact with a top surface of the first island-shaped semiconductor film, a side surface of the first insulating film, a side surface of the floating gate, a side surface of the second insulating film, and a top surface of the second island-shaped semiconductor film, and wherein a part of an end portion of the first island-shaped semiconductor film is coextensive with a part of an end portion of the first insulating film and a part of an end portion of the floating gate.