| 摘要 |
PROBLEM TO BE SOLVED: To provide an aerosol deposition device having a high film deposition rate.SOLUTION: An aerosol deposition apparatus 10 comprises: a film deposition chamber 11 having a substrate holding part 11b for holding a filming substrate 20, and a filming nozzle 11a; an aerosol generating part 12 for feeding material particles in an aerosol state to the filming nozzle 11a; a carrier gas supply part 13 for supplying a carrier gas to the aerosol generating part 12; and a charging plate 14 of electric insulation properties including a first face directed to the side of the filming nozzle 11a, a second face directed to the side of the substrate holding part 11b, and an open hole H extending from the first face to the second face and arranged between the filming nozzle 11a and the substrate holding part 11b. |
