| 摘要 |
PROBLEM TO BE SOLVED: To provide an exposure device capable of smoothly performing immersion exposure to a plurality of substrates on which a plurality of types of photoresist layers are respectively provided.SOLUTION: In exposing a substrate by projecting an image of a pattern on the substrate through a projection optical system and liquid, an optimal immersion condition for a film member formed on a liquid contact surface on the substrate is selected from immersion conditions stored in a storage device. |
