发明名称 |
SEMICONDUCTOR LIGHT-EMITTING ELEMENT AND MANUFACTURING METHOD OF THE SAME |
摘要 |
PROBLEM TO BE SOLVED: To provide a light-emitting element having a planar electrode structure by forming an n-side electrode without removing a p-type layer; and provide a manufacturing method of the light-emitting element.SOLUTION: A semiconductor light-emitting element comprises: an n-type change formation region 6 formed by changing a region subjected to ion implantation of an impurity within a range from a surface of a p-type layer 4 to reach an n-type layer 2 to an n-type; and an n-side electrode 7 joined to the n-type change formation region. A manufacturing method comprises: a process of ion implanting an impurity under a channeling condition; a process of supplying an impurity by ion implantation under a non-channeling condition or a knock-on phenomenon; a process of annealing an ion-implanted region; and a process of connecting the n-side electrode to a surface of a region changed to the n-type. |
申请公布号 |
JP2014192411(A) |
申请公布日期 |
2014.10.06 |
申请号 |
JP20130067937 |
申请日期 |
2013.03.28 |
申请人 |
TOYOHASHI UNIV OF TECHNOLOGY |
发明人 |
WAKAHARA AKIHIRO;OKADA HIROSHI;SEKIGUCHI HIROTO |
分类号 |
H01L33/02;H01L33/48 |
主分类号 |
H01L33/02 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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