发明名称 VAPOR DEPOSITION APPARATUS
摘要 <p>PROBLEM TO BE SOLVED: To provide an evaporation source capable of preventing occurrence of dispersion of a temperature in a crucible, and having a small energy loss, in a vapor deposition apparatus having a linear evaporation source having a long crucible.SOLUTION: In an evaporation source 4 having a crucible 22 extending in a first direction, and having a plurality of openings 34 opened side by side in the first direction on the upper surface, and a heater 23 which is first heating means arranged on the outside of the crucible 22, for heating the crucible 22, the reflection surface of each inclined reflection board 41 which is second heating means provided along the surface extending in the first direction of the crucible 22 on the outside of the crucible 22 is arranged toward each end in the first direction of the crucible 22.</p>
申请公布号 JP2014189878(A) 申请公布日期 2014.10.06
申请号 JP20130068874 申请日期 2013.03.28
申请人 HITACHI HIGH-TECHNOLOGIES CORP 发明人 MATSUURA HIROYASU;MINEKAWA HIDEAKI;OGATA TOMOHIKO;MOCHIZUKI MASAAKI;KOTAKE HIDEO
分类号 C23C14/24;H01L51/50;H05B33/10 主分类号 C23C14/24
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