| 摘要 |
<p><P>PROBLEM TO BE SOLVED: To provide a method of patterning a silicone oxide film simply and inexpensively. <P>SOLUTION: A patterning method of a silicon oxide film comprises: a step of forming an oily ink pattern on a substrate; a step of coating an organosilicon polymer on the substrate on which the oily ink pattern is formed; a step of forming the silicon oxide film by oxidizing the organosilicon polymer formed on the substrate in a hot plate method and then forming a pattern of the silicon oxide film having a pattern shape that is the opposite of the pattern shape of the oily ink by peeling the silicon oxide film on the oily ink pattern by dissolving the oily ink; and a step of cleaning the substrate on which the pattern of the silicon oxide film is formed and removing the dissolved oily ink and the peeled silicon oxide film. <P>COPYRIGHT: (C)2012,JPO&INPIT</p> |
