PULSED LINE BEAMS

摘要

Processes such as annealing amorphous silicon to form polysilicon use exposures to pulsed laser beams provided by laser diodes or arrays of laser diodes. An optical beam based on plurality of beams from respective laser diodes is shaped and directed to a substrate. Duty cycles of the laser diodes are selected to be less than about 0.2, so that °s can be greater than available in continuous wave operation. An amorphous silicon layer on a rigid or flexible substrate is processed to produce a polysilicon layer with a mobility of at least 50 cm2/Vs.

主权项

1. A method, comprising:
selecting a substrate; and processing the substrate by exposing the substrate to a pulsed optical beam from a laser diode in an exposure area.