PATTERN EVALUATION DEVICE AND OUTER APPEARANCE INSPECTION DEVICE INCLUDING THE PATTERN EVALUATION DEVICE

摘要

PROBLEM TO BE SOLVED: To provide a pattern evaluation technique for evaluating a circuit pattern by obtaining only a deformation due to the layout design of the circuit pattern.SOLUTION: A pattern evaluation device includes: a model estimation unit for estimating a model due to a manufacturing method from an inspection image; a deformation amount estimation unit for estimating the deformation amount of the inspection image through the use of the estimated model; a reference data deformation unit for deforming reference data through the use of the estimated deformation amount; and an evaluation unit for performing evaluation processing by comparing the reference data deformed by the reference data deformation unit with the inspection image.