| 摘要 |
<p>The present invention relates to a phase shift blank mask obtained by forming a phase shift layer in a continuous layer or a multilayer containing a metal and at least one of silicon (Si), oxygen (O) and nitrogen (N), and forming an uppermost phase shift layer in an oxidative phase shift layer. Thus, a phase shift blank mask including a phase shift layer having improved chemical resistance and durability in a washing solution during performing a washing process using the washing solution containing ozone (O_3), Hot-DI, and chemicals such as ammonia (NH_4OH), sulfuric acid (H_2SO_4), etc., may be provided.</p> |
