发明名称 VERTICAL NANOWIRE BASED HETERO-STRUCTURE SPLIT GATE MEMORY
摘要 A memory cell is disclosed. The memory cell includes a vertical base disposed on a substrate. The vertical base includes first and second channels between top and bottom terminals. The memory cell also includes a first gate surrounding the first channel and a second gate surrounding the second channel. The first and second gates form a gate-all-around transistor of the memory cell.
申请公布号 US2014159114(A1) 申请公布日期 2014.06.12
申请号 US201213707617 申请日期 2012.12.07
申请人 GLOBALFOUNDRIES SINGAPORE PTE. LTD. 发明人 ZHENG Ping;TOH Eng Huat;SUN Yuan
分类号 H01L29/78;H01L29/66 主分类号 H01L29/78
代理机构 代理人
主权项 1. A memory cell comprising: a vertical base disposed on a substrate, the vertical base includes first and second channels between top and bottom terminals; a first gate surrounding the first channel; and a second gate surrounding the second channel, wherein the first and second gates form a gate-all-around transistor of the memory cell.
地址 Singapore SG