| 摘要 |
An exposure apparatus is equipped with two stages (WST1, WST2) that are movable independently from each other and each have a table (WTB) at which a grating (RG) is provided at a position under a surface where a wafer (W) is mounted, and a measurement stage (MST)that is movable independently from the two stages and performs a measurement related to exposure based on a light-receiving result of the energy beam received via an optical system. In an exposure station (200) and a measurement station (300), a first measurement system and a second measurement system are respectively provided which measure the position of the table that the stage has, by irradiating the grating of the stage from below with a measurement beam. |
