| 发明名称 |
HARDMASK COMPOSITION AND METHOD OF FORMING PATTERNS USING THE HARDMASK COMPOSITION |
| 摘要 |
The present invention relates to a hardmask composition including a polymer represented by chemical formula 1, a monomer represented by chemical formula 2, and a solvent, wherein the content of the monomer is higher than the content of the polymer; and to a method for forming patterns by using the hardmask composition. In chemical formula 1 and 2, AR1, AR2, R_1 to R_6, x, y, and n are as defined in the patent specification. |
| 申请公布号 |
KR20140052411(A) |
申请公布日期 |
2014.05.07 |
| 申请号 |
KR20120118491 |
申请日期 |
2012.10.24 |
| 申请人 |
CHEIL INDUSTRIES INC. |
发明人 |
LEE, CHEOL HO;PARK, YOU JUNG;YOON, YONG WOON;LEE, SUNG JAE;CHO, YOUN JIN;KIM, YOUNG MIN;LEE, CHUNG HEON |
| 分类号 |
G03F7/004;G03F1/00;G03F7/26 |
主分类号 |
G03F7/004 |
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