| 摘要 |
A radiation-sensitive resin composition includes a resin that includes a repeating unit shown by the following formula (1) and a solvent. The radiation-sensitive resin composition has an excellent performance as a radiation-sensitive acid generator, includes a resin that adversely affects the environment and a human body to only a small extent, and can form a resist film that has a high resolution and forms an excellent resist pattern.
wherein R 1 represents a hydrogen atom or the like, M + represents a specific cation, and n represents an integer from 1 to 5. |
