| 摘要 |
PROBLEM TO BE SOLVED: To provide a technique for suppressing action of radicals on an arc chamber constituting an ion source.SOLUTION: An ion generating method using a DC discharge ion source including an arc chamber composed of a high melting point material includes an ion generation step for generation ions by colliding the molecules of a source gas and thermions in the arc chamber thereby causing a plasma discharge, and a reaction step for causing radicals generated in the ion generation step to react on a liner disposed to cover at least a part of the inner wall of the arc chamber. When compared with the arc chamber, the liner is composed of a material that reacts easily on radicals generated when the source gas is decomposed. |
