发明名称 SEMICONDUCTOR STORAGE DEVICE AND MANUFACTURING METHOD THEREOF
摘要 A semiconductor storage device according to the present embodiment includes a semiconductor substrate. A memory cell array includes a plurality of memory cells provided on the semiconductor substrate in an array direction. A selection gate transistor is provided on an end of the memory cell array, and is used to select the memory cells from the memory cell arrays. A dummy cell is provided between a gate electrode of one of the memory cells on the end of the memory cell array and a gate electrode of the selection gate transistor. The width of a gate electrode of the dummy cell in the array direction of the memory cells and the dummy cell is twice or more as large as the width of the gate electrode of one of the memory cells.
申请公布号 US2014070296(A1) 申请公布日期 2014.03.13
申请号 US201314019722 申请日期 2013.09.06
申请人 KABUSHIKI KAISHA TOSHIBA 发明人 MATSUNO KOICHI;YANAI YOSHIHIRO
分类号 H01L27/105 主分类号 H01L27/105
代理机构 代理人
主权项
地址