发明名称 Semiconductor device comprising string structures formed on active region
摘要 A semiconductor device having a string gate structure and a method of manufacturing the same suppress leakage current. The semiconductor device includes a selection gate and a memory gate. The channel region of the selection gate has a higher impurity concentration than that of the memory gate. Impurities may be implanted at different angles to form the channel regions having different impurity concentrations.
申请公布号 US8653578(B2) 申请公布日期 2014.02.18
申请号 US20090555830 申请日期 2009.09.09
申请人 LEE CHANGHYUN;CHOI JUNGAL;SAMSUNG ELECTRONICS CO., LTD. 发明人 LEE CHANGHYUN;CHOI JUNGAL
分类号 H01L29/788 主分类号 H01L29/788
代理机构 代理人
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