发明名称 Lithographic apparatus and sensor therefor
摘要 A sensor for use at substrate level in a high numerical aperture lithographic apparatus, the sensor having a transparent plate that covers a sensing element and includes elements that improve coupling of radiation into the sensing element. The improved coupling elements include a flowing liquid medium disposed between the transparent plate and the sensing element.
申请公布号 US8629418(B2) 申请公布日期 2014.01.14
申请号 US20060591674 申请日期 2006.11.02
申请人 VAN DE KERKHOF MARCUS ADRIANUS;KOK HAICO VICTOR;KRUIZINGA BORGERT;SENGERS TIMOTHEUS FRANCISCUS;MOEST BEARRACH;HAAST MARC ANTONIUS MARIA;WEISSBRODT PETER WERNER;SCHRENK MANFRED HELMUT GUSTAV WILHELM JOHANNES;HARZENDORF TORSTEN;ASML NETHERLANDS B.V. 发明人 VAN DE KERKHOF MARCUS ADRIANUS;KOK HAICO VICTOR;KRUIZINGA BORGERT;SENGERS TIMOTHEUS FRANCISCUS;MOEST BEARRACH;HAAST MARC ANTONIUS MARIA;WEISSBRODT PETER WERNER;SCHRENK MANFRED HELMUT GUSTAV WILHELM JOHANNES;HARZENDORF TORSTEN
分类号 G01N15/06;H01J3/14 主分类号 G01N15/06
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