发明名称 |
CHARGED PARTICLE BEAM APPARATUS |
摘要 |
<p>Provided is a charged particle beam apparatus or charged particle microscope capable of observing an observation target sample in an air atmosphere or a gas environment without making significant changes to the configuration of a conventional high vacuum charged particle microscope. In a charged particle beam apparatus configured such that a thin film (10) is used to separate a vacuum environment and an air atmosphere (or a gas environment), an attachment (121) capable of holding the thin film (10) and whose interior can be maintained at an air atmosphere or a gas environment is inserted into a vacuum chamber (7) of a high vacuum charged particle microscope. The attachment (121) is vacuum-sealed and fixed to a vacuum partition of the vacuum sample chamber. Image quality is further improved by replacing the atmosphere in the attachment with helium or a light-elemental gas that has a lower mass than atmospheric gases such as nitrogen or water vapor.</p> |
申请公布号 |
KR20130135341(A) |
申请公布日期 |
2013.12.10 |
申请号 |
KR20137026494 |
申请日期 |
2012.03.02 |
申请人 |
HITACHI HIGH-TECHNOLOGIES CORPORATION |
发明人 |
OMINAMI YUSUKE;ITO SUKEHIRO;OHTAKI TOMOHISA |
分类号 |
H01J37/20;H01J37/18;H01J37/28 |
主分类号 |
H01J37/20 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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