发明名称 Three-dimensional semiconductor memory devices
摘要 Provided are three-dimensional semiconductor devices. The device includes conductive patterns stacked on a substrate, and an active pattern penetrating the conductive patterns to be connected to the substrate. The active pattern includes a first doped region disposed adjacent to at least one of the conductive patterns, and a diffusion-resistant doped region overlapped with at least a portion of the first doped region. The diffusion-resistant doped region may be a region doped with carbon.
申请公布号 US8598647(B2) 申请公布日期 2013.12.03
申请号 US201113291519 申请日期 2011.11.08
申请人 KIM DONGWOO;NAKANISHI TOSHIRO;LIM SEUNGHYUN;KIM BIO;HWANG KIHYUN;AHN JAEYOUNG;SAMSUNG ELECTRONICS CO., LTD. 发明人 KIM DONGWOO;NAKANISHI TOSHIRO;LIM SEUNGHYUN;KIM BIO;HWANG KIHYUN;AHN JAEYOUNG
分类号 H01L29/788 主分类号 H01L29/788
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