发明名称 Photoelectric conversion device, fabrication method for the same, and solid state imaging device
摘要 A photoelectric conversion device has a high S/N ratio and can increase the detection efficiency even under a low luminance. The photoelectric conversion device generates an increased electric charge by impact ionization in a photoelectric conversion unit formed from a chalcopyrite type semiconductor, so as to improve dark current characteristic. The photoelectric conversion device includes: a lower electrode layer; a compound semiconductor thin film of chalcopyrite structure disposed on the lower electrode layer and having a high resistivity layer on a surface; and a transparent electrode layer disposed on the compound semiconductor thin film , wherein the lower electrode layer, the compound semiconductor thin film, and the transparent electrode layer are laminated one after another, and a reverse bias voltage is applied between the transparent electrode layer and the lower electrode layer, and the multiplication by the impact ionization of the electric charge generated by photoelectric conversion is generated within the compound semiconductor thin film. It is also possible to provide a fabrication method for such photoelectric conversion device, and a solid state imaging device using the photoelectric conversion device.
申请公布号 US8592933(B2) 申请公布日期 2013.11.26
申请号 US20090937013 申请日期 2009.03.30
申请人 MIYAZAKI KENICHI;MATSUSHIMA OSAMU;NIKI SHIGERU;SAKURAI KEIICHIRO;ISHIZUKA SHOGO;ROHM CO., LTD.;NATIONAL INSTITUTE OF ADVANCED INDUSTRIAL SCIENCEAND TECHNOLOGY 发明人 MIYAZAKI KENICHI;MATSUSHIMA OSAMU;NIKI SHIGERU;SAKURAI KEIICHIRO;ISHIZUKA SHOGO
分类号 H01L31/00 主分类号 H01L31/00
代理机构 代理人
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