| 摘要 |
The invention relates to a method for simulating the placement of patterns by self-assembly of block copolymers in a contour printed on a board by lithography, which comprises the following steps: extraction (100) of geometric parameters (P) of the contour saved in the memory; selection (102, 104, 106), by a processor having access to the memory, of at least one local extremum of an interference pattern produced inside the contour on the basis of geometric parameters (P) of the contour by applying a model for propagation of waves interfering with one another; and provision (108), by the processor and on the basis of said local extremum, of parameters (M) for placing at least one pattern intended for being obtained by self-assembly of block copolymers in the contour. |
