| 摘要 |
<p>In the present invention, there is provided a vacuum deposition apparatus in which a partitioning part is exceptionally durable, the vacuum deposition apparatus enabling a thick vapor-deposition film of predetermined composition to be formed on a traveling film surface in a stable and continuous manner, and at a high level of quality, over a prolonged period of time. The vacuum-deposition apparatus is characterized in being provided with a material-holding means having a partitioning part for keeping at least two or more different types of vapor-deposition materials apart in a vacuum tank and a linking plate for holding the partitioning part at a fixed spacing, and a heating means for causing the vapor-deposition material to evaporate; and in that the partitioning part has a mechanism capable of extending or contracting in a direction orthogonal to the partitioning direction in a vacuum-deposition apparatus for forming a vapor-deposition film on a film traveling through the vacuum tank.</p> |
