发明名称 SEMICONDUCTOR MEMORY DEVICE AND METHOD OF MANUFACTURING THE SAME
摘要 <p>PURPOSE: An LSI semiconductor memory device and a manufacturing method thereof are provided to stably manufacture the LSI semiconductor memory device by using a transistor with a horizontal channel structure as a switching device. CONSTITUTION: An active area is formed on the upper surface of a semiconductor substrate (10) with a floating type. The active area includes a plurality of unit active areas. A pair of word lines cross the unit active areas. A dummy word line is orthogonal to the active area. A source area is formed on the unit active area between the word lines. A drain area is located on the unit active area between the word line and the dummy word line.</p>
申请公布号 KR20130104527(A) 申请公布日期 2013.09.25
申请号 KR20120026091 申请日期 2012.03.14
申请人 SK HYNIX INC. 发明人 LEE, JANG UK;KIM, SUNG CHEOUL;CHOI, KANG SIK;KIM, SUK KI
分类号 H01L27/115;H01L21/8247 主分类号 H01L27/115
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