发明名称 |
SEMICONDUCTOR STRUCTURES HAVING REDUCED CONTACT RESISTANCE |
摘要 |
PROBLEM TO BE SOLVED: To form high-quality ohmic contacts on a group III-V semiconductor material and manufacture a semiconductor device with low power consumption and a long life.SOLUTION: A semiconductor device 500 comprises a first group III-V semiconductor layer 510, a group III-V semiconductor intermediate layer, and a metal layer 530 having a Fermi energy level. The Fermi energy level of the metal layer 530 is above the valence band energy levels of the first group III-V semiconductor layer 510 and the group III-V semiconductor intermediate layer. The energy level of the group III-V semiconductor intermediate layer is between the Fermi energy level of the metal layer 530 and the valence band energy level of the first group III-V semiconductor layer 510. The group III-V semiconductor intermediate layer includes a second group III-V semiconductor layer 520 and a third group III-V semiconductor layer 525. |
申请公布号 |
JP2013168668(A) |
申请公布日期 |
2013.08.29 |
申请号 |
JP20130084638 |
申请日期 |
2013.04.15 |
申请人 |
BLUESTONE INNOVATIONS HOLDINGS LP |
发明人 |
VAN DE WALLE CHRISTIAN G |
分类号 |
H01L21/28;H01L29/20;H01L29/201;H01L29/47;H01L33/00;H01S5/042;H01S5/323 |
主分类号 |
H01L21/28 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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