| 摘要 |
An optical metrology and image correction device includes a point size light source adapted to emit a beam of light and a translucent mask that receive the beam of light. The translucent mask rotates from a first position wherein the beam of light is received by the translucent mask in a direction substantially orthogonal to the translucent mask to a second position wherein the beam of light is received by the translucent mask at an angle offset with respect to the translucent mask. A corresponding method of measuring and correcting an image from an optical metrology and image correction device includes emitting a beam of light from a point size light source, causing the beam of light to be received by a translucent mask in a first position substantially orthogonal to the mask and in a second position in a direction offset with respect to the translucent mask. |
