发明名称 Method for fabricating a micro-electronic device equipped with semi-conductor zones on an insulator with a horizontal GE concentration gradient
摘要 A manufacturing method of a microelectronic device including at least one semi-conductor zone which rests on a support and which exhibits a germanium concentration gradient in a direction parallel to the principal pane of the support.
申请公布号 US8501596(B2) 申请公布日期 2013.08.06
申请号 US20090560867 申请日期 2009.09.16
申请人 VINCENT BENJAMIN;DESTEFANIS VINCENT;COMMISSARIAT A L'ENERGIE ATMOIQUE 发明人 VINCENT BENJAMIN;DESTEFANIS VINCENT
分类号 H01L21/20;H01L21/36 主分类号 H01L21/20
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