| 摘要 |
PROBLEM TO BE SOLVED: To provided a processing method for an ink jet head substrate, which can eliminate a process of forming a protective film for protecting a substrate surface against debris generated during laser processing and a process of removing the protective film.SOLUTION: There is provided the processing method for an ink jet head substrate, including: forming a barrier layer on the substrate and forming a seed layer on the barrier layer; forming a resist film on the seed layer and patterning the resist film so that the patterned resist film corresponds to a pad portion for electrically connecting an ink jet head to a body; forming the pad portion in an opening of the patterned resist film; removing the resist film; performing laser processing from a surface of the substrate; subjecting the substrate to anisotropic etching to form an ink supply port; and removing the barrier layer and the seed layer in this order. |
