| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a resist composition by which a resist pattern excellent in resolution can be manufactured. <P>SOLUTION: A resist composition includes a resin which contains a group unstable to an acid and decomposes by the action of an acid to increase solubility with an aqueous alkali solution, an acid generator, and a compound represented by the formula (I). In the formula (I), a ring H<SP POS="POST">1</SP>represents a 3-20C aromatic heterocycle which may have a substituent, and R<SP POS="POST">1</SP>, R<SP POS="POST">2</SP>, R<SP POS="POST">3</SP>and R<SP POS="POST">4</SP>each independently represent a 1-20C alkyl group. <P>COPYRIGHT: (C)2013,JPO&INPIT |
