发明名称 METHOD FOR REPRODUCING CERIUM OXIDE-BASED ABRASIVE SLURRY AND REPRODUCED CERIUM OXIDE-BASED ABRASIVE SLURRY
摘要 <P>PROBLEM TO BE SOLVED: To reproduce performance as abrasive by simple reproduction processing in used abrasive slurry. <P>SOLUTION: This method for reproducing the cerium oxide-based abrasive slurry for polishing a glass material includes the following processes: a first process for removing polishing waste having a larger particle size than that of the abrasive from the used abrasive slurry after polishing the glass material; a second process for removing polishing waste having a smaller particle size than that of the abrasive from the used abrasive slurry after polishing the glass material; and a third process for obtaining the reproduced cerium oxide-based abrasive slurry by adding metal fluoride to recovered abrasive slurry obtained by removing the polishing waste in the first process and second process. <P>COPYRIGHT: (C)2013,JPO&INPIT
申请公布号 JP2013086204(A) 申请公布日期 2013.05.13
申请号 JP20110228201 申请日期 2011.10.17
申请人 SHINRYO CORP 发明人 SUETSUGU YUKIHITO;YAMAOKA SHINYA;TAKEDA TORU
分类号 B24B57/00;B03B5/00;B03B5/28;B24B37/00;C02F11/00;C09K3/14 主分类号 B24B57/00
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