发明名称 |
METHOD FOR REPRODUCING CERIUM OXIDE-BASED ABRASIVE SLURRY AND REPRODUCED CERIUM OXIDE-BASED ABRASIVE SLURRY |
摘要 |
<P>PROBLEM TO BE SOLVED: To reproduce performance as abrasive by simple reproduction processing in used abrasive slurry. <P>SOLUTION: This method for reproducing the cerium oxide-based abrasive slurry for polishing a glass material includes the following processes: a first process for removing polishing waste having a larger particle size than that of the abrasive from the used abrasive slurry after polishing the glass material; a second process for removing polishing waste having a smaller particle size than that of the abrasive from the used abrasive slurry after polishing the glass material; and a third process for obtaining the reproduced cerium oxide-based abrasive slurry by adding metal fluoride to recovered abrasive slurry obtained by removing the polishing waste in the first process and second process. <P>COPYRIGHT: (C)2013,JPO&INPIT |
申请公布号 |
JP2013086204(A) |
申请公布日期 |
2013.05.13 |
申请号 |
JP20110228201 |
申请日期 |
2011.10.17 |
申请人 |
SHINRYO CORP |
发明人 |
SUETSUGU YUKIHITO;YAMAOKA SHINYA;TAKEDA TORU |
分类号 |
B24B57/00;B03B5/00;B03B5/28;B24B37/00;C02F11/00;C09K3/14 |
主分类号 |
B24B57/00 |
代理机构 |
|
代理人 |
|
主权项 |
|
地址 |
|