发明名称 |
PATTERN FORMING METHOD, MULTI-LAYERED RESIST PATTERN, MULTI-LAYERED FILM FOR ORGANIC SOLVENT DEVELOPMENT, MANUFACTURING METHOD OF ELECTRONIC DEVICE, AND ELECTRONIC DEVICE |
摘要 |
<p>A pattern forming method contains: (i) a step of forming a bottom anti-reflective coating on a substrate by using a first resin composition (I), (ii) a step of forming a resist film on the bottom anti-reflective coating by using a second resin composition (II), (iii) a step of exposing a multi-layered film having the bottom anti-reflective coating and the resist film, and (iv) a step of developing the bottom anti-reflective coating and the resist film in the exposed multi-layered film by using an organic solvent-containing developer to form a negative pattern.</p> |
申请公布号 |
WO2013062133(A1) |
申请公布日期 |
2013.05.02 |
申请号 |
WO2012JP78264 |
申请日期 |
2012.10.25 |
申请人 |
FUJIFILM CORPORATION |
发明人 |
KATO, KEITA;SHIRAKAWA, MICHIHIRO;ODANI, TADAHIRO;NAKAMURA, ATSUSHI;TAKAHASHI, HIDENORI;IWATO, KAORU |
分类号 |
G03F7/095;G03F7/038;G03F7/039;G03F7/11;G03F7/32 |
主分类号 |
G03F7/095 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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